Electron beam lithography systems for all requirements
Raith’s wide range of electron beam lithography systems provides solutions for all of your application challenges that require high resolution, high speed, full automation, or versatility.
These innovative, intelligently configured electron beam lithography systems allow easy and effective access to nanofabrication. All Raith EBL systems are equipped with a high-precision laser interferometer stage and pattern generators to deliver the maximum precision and speed for the work you do. Further features – like traxx and periodixx, the stitching-error-free exposure modes, and Nanosuite, the intuitive and comprehensive nanolithography software – set Raith’s systems apart from other nanolithography equipment. Contact us to discuss which system would best fit your needs.
Questions?
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Dedicated electron beam lithography systems
Automation, stability and throughput

The EBPG Plus high-performance nanolithography system provides up to 8-inch capability at 100 kV. Its full automation, high speed, and high resolution can generate leading-edge lithography for operations at centers of excellence as well as semiconductor fabrication.