Home/DOWNLOADS/Application Notes

Downloads Application Notes

Our customers work in all sorts of different fields and continually achieve great results. Some of those have been described in application notes. Take a look at the various topics and download our application notes. Couldn’t find what you are looking for? Get in touch with us now and let us know how we can help you!

Metalens Fabrication

An algorithmic pattern preparation for the fabrication of metalenses enable high throughput and high-resolution at the same time. The Application Note shows how you can circumvent the creation of a design layout and subsequent conversion to the GDF format and therefore speeding up your fabrication process significantly all while still achieving precise shape placement and edge definition with minimum line edge roughness.

Sketch & Peel

A standard adhesive tape can help overcome the relatively slow patterning speed of direct FIB milling. The Application Note explains the new sketch & peel approach in detail and also investigates the change in outcome when using different ion species. Learn how simple adhesive tape can help you increase your throughput up to several orders of magnitude compared to usual FIB milling.

Organic Ice Resist

As compared to traditional nanopatterning methods like EBL or other e-beam based alternatives such as FEBID and ice lithography, the newly discovered method using “organic ice resist” (OIR) opens new possibilities for nanopatterning. The application note explains the advantages of negative-tone direct-write OIR processes which eliminate the solvent development and drying required for EBL, thus allowing for further sample processing either in situ or ex situ.

Photonic circuits for on-chip quantum optics

Quantum computing is a rapidly developing field where single photons can be used in applications such as secure communication and simulation of complex systems. This application note shows how a Raith EBPG system is used to pursue an on-chip approach with integrated optics, to avoid the problems of alignment, stabilization, and required space arising with the usual approach using bulk optics.

Continuous electron beam lithography writing mode for optical waveguide nanofabrication - traxx

Fabrication of long connected structures over several mm to the highest degree of perfection is a challenge in electron beam lithography and FIB nanofabrication. This application note explains how Raith’s unique Fixed Beam Moving Stage (FBMS) exposure technology can be used to fabricate perfect stitching-error-free arrayed couplings and tapered waveguides up to lengths of several mm.

Sub-nm pitch control of stitching-error-free millimeter-long periodic structures - periodixx

Many applications in photonics and plasmonics depend on nanofabrication of large-area periodic structures with high pattern fidelity. This application note shows how the unique Modulated Beam Moving Stage (MBMS) technology fabricates periodic structures such as distributed feedback DFB gratings and photonic crystal waveguides with sub-nm pitch control and no stitching errors.

Ion beam lithography for Fresnel zone plate fabrication in gold on membranes

Fresnel zone plates are widely used as diffractive-based focusing elements in X-ray microscopy, achieving resolutions down to 25 nm. While they are typically prepared by EBL, this application note shows how the fabrication of zone plates by a dedicated FIB nanofabrication system (Raith ionLINE) is able to significantly reduce the fabrication steps while still deliver the necessary high resolution.

Electrical in-situ Characterization of Au/Ni/Au-Nanowires with Nanomanipulators

Electrical characterization of nanowires with usual probing stations requires the use of metal electrodes with a size of several microns. Various methods are used to contact electrodes and nanowires. This application note describes an alternative approach that makes use of in-situ electrical measurements and proves to be much more efficient and less time-consuming than traditional methods.

Enabling sub-nm 3D metrology inside an Electron Beam Lithography (EBL) tool by integration of an in-situ atomic force microscope (AFM)

For determination and control of material growth/etching rates or surface topography, an in-situ AFM inside a nanoengineering tool is the ideal complement to the 2D imaging capabilities of a Raith EBL tool. This application note shows how the integration of an AFM into an eLINE Plus adds 3D metrology to the nanoengineering system and exceeds the capability of traditional EBL tools in terms of e.g. 3D surface topography analysis for nanolithography on non-planar surfaces.

Transforming randomly distributed 1D and 2D material into functional devices with the help of SEM mapping and innovative offline data preparation for direct-write lithography

In research environments, 2D materials are often randomly distributed on a substrate. One of the biggest challenges is the accurate placement of multiple process steps on top of them. This application note presents an innovative workflow including automated mapping of the sample and offline data preparation for efficient use of the EBL tool resources.

Efficient volume production of periodic nanostructures

Many applications in photonics, optoelectronics, displays, biosensors, etc. involve covering large areas with periodic nanostructures. To complement serial EBL writings, this application note describes the combination of an electron beam lithography system and photolithography system to efficiently fabricate periodic nanostructures over large areas with high precision and high throughput.

Your work

Are you working on a Raith system and have achieved a remarkable result? Enter for our Micrograph award and win one of our attractive prizes, or contact us to explore how we can work together on an application note and spread the word about the work you are doing.