Introduction
The multifunctional EBL system family comprises three distinct products that cover the broadest possible range of applications. Relying on the ultra-high-resolution electron optical column, they all offer dedicated e-beam lithography and excellent imaging capabilities as well as their own individual specificities and laser interferometer stage sizes.
The recently upgraded E-LINE is now in its fourth generation. This new E-LINE is equipped with new hardware components and software modules, delivering improved performance with significantly better specifications—resulting in the world’s smallest beam size in a professional EBl system, dramatically reduced values for stitching and overlay specifications, enhanced writing speeds, and greater pattern fidelity. It still offers by far the widest range of nanoengineering hardware options, making it the “Swiss army knife of nanofabrication.
PIONEER, with its dedicated RT-stage, has been designed as a write-and-view configuration and is the ideal e-beam writer / SEM hybrid, while RAITH150 comes with a thermocover and automated load lock, offering the highest degree of stability and automation for wafer-scale exposures.
The recently upgraded E-LINE is now in its fourth generation. This new E-LINE is equipped with new hardware components and software modules, delivering improved performance with significantly better specifications—resulting in the world’s smallest beam size in a professional EBl system, dramatically reduced values for stitching and overlay specifications, enhanced writing speeds, and greater pattern fidelity. It still offers by far the widest range of nanoengineering hardware options, making it the “Swiss army knife of nanofabrication.
PIONEER, with its dedicated RT-stage, has been designed as a write-and-view configuration and is the ideal e-beam writer / SEM hybrid, while RAITH150 comes with a thermocover and automated load lock, offering the highest degree of stability and automation for wafer-scale exposures.
Key features
- Gemini technology-based ultra-high resolution electron optical column
- Single-digit nm resolution for EBL
- Highest precision laser interferometer stage (2-inch, 4-inch, or 6-inch travel range)
- Various detectors for SEM imaging / metrology and analysis
- Wide range of nanoengineering options
- RAITH Nanosuite system control software
- Auto focus, auto stigmator, auto brightness, and auto contrast functionality
Benefits
A true bestseller in academia
Multifunctionality
As the system category for the Gemini-based EBL systems already indicates, there is no other EBL system in the world that combines state-of-the-art SEM imaging and analysis, metrology, and further nanoengineering capabilities with its EBL functionalities.
Flexibility and versatility
RAITH multifunctional systems are supplied with the RAITH Nanosuite, offering ultimate flexibility and versatility to enable the broadest range of applications and specific workflow customization.
Modularity and upgradability
Whatever new and future research trends bring, RAITH multifunctional systems can be individually upgraded per system to address new application challenges, so they can evolve in step with your research.
Smart
Motion
Perfect
Shapes
Ultra
Positioning
Software
All you need to cope with your application specific requirements
Designed for automated exposure operations
The proprietary Digital RAITH Nanosuite control software, with its various modules, is the most comprehensive and fully integrated nanolithography software available.
GDSII CAD layout editor
The integrated professional layout design editor/viewer streamlines data import and conversion processes, eliminating the need for third-party software.
Mix and Match capabilities
Whether your application involves contacting nanoscaled features, automatic mark recognition for perfect overlay, multilevel lithography, or combining different lithography techniques, the RAITH Nanosuite delivers suitable functionalities and workflows.
Full exposure job automation & customization
System operators can control all functions of the system and exploit its capabilities from a single software platform. No need to exchange data between different programs.
Dedicated imaging and metrology functionality
As a lithographer, you want to expose your sample, but also verify your design. To ensure that your sample’s structures meet the dimensions of the original design, the Digital RAITH Nanosuite offers comprehensive imaging and metrology capabilities.
True multi-user environment
RAITH Nanosuite has more to offer than Windows Explorer—such as data administration. User authentication is required for logging in, and different user levels allow access to specific sensitive system parameters. Individual users find the system as they left it without affecting others.
Proximity effect correction
RAITH Nanosuite ensures physics are considered throughout integrated proximity-effect corrections. Complex electron interactions in resist and in the sample sometimes require comprehensive optimization of local dose distribution. The integrated proximity-effect correction ensures highest pattern fidelity when applied to original GDSII design, and can simulate 3D resist profiles.
3D / grayscale lithography
Knowing the resist contrast curve is essential for proper transfer of equidistant gray levels into your resist. The RAITH Nanosuite supports resist contrast curve data import and calculates appropriate local dose distribution accordingly.
GDSII-Patterning on Image
RAITH Nanosuite can acquire an image and directly overlay a GDSII design onto it with no need for time-consuming overlay or mark recognition procedures. This can drastically speed up nanocontacting applications and deposition or milling jobs.
Continuous and stitch-error-free patterning modes
RAITH is the only company that offers patterning modes based on RAITH proprietary FBMS and MBMS technology, where the stage is continuously moving during an exposure and follows a pre-defined path, thus avoiding stitching errors.
100 person-years of software programming
Technical data
< 1.2 nm for E-LINE 100
World’s smallest beam diameter
< 5 nm
Line width in EBL
up to 8-inch
Sample handling
Application focus
Load lock
Automated laser height sensing
Automated in-situ piezo
height levelling
height levelling
Stage z-travel
RT-module
Thermal / acoustic shield
Nanoengineering options
Continuous patterning modes
(FBMS / MBMS)
(FBMS / MBMS)
Detectors
Are you interested in more details and insights?
New E-LINE Flyer
PIONEER Product Brochure (.pdf)
RAITH150 Product Brochure (.pdf)
Application pattern
Bringing applications to perfection
Sub 5 nm lines in HSQ e-beam resist J. Yang, D. Morecroft, M. Mondol, K. Berggren, MIT, and J. Klingfus, Raith USA
Dense devices: 1kB crosspoint RRAM Sunghyun Jo, University of Michigan, USA
Advanced EBL: Photonic crystal structure in membrane (un-deretched) William Whelan-Curtin, University of St. Andrews, UK
Metallic lateral spin valves F. Casanova et al., CIC nanoGUNE, San Sebastian, Spain
Precise neurite guidance by nanogratings Laboratorio NEST Pisa, Nano Lett. 2011, 11, 505-511
Nanoprobing of freely suspended Pt-nanowire, deposited on gold contact pads with EBID
EBID-Deposit nanoprofilometry for growth rate determination
3D nanosculpturing by electron beam induced deposition (EBID)
Imaging with BSE detector for chemical element contrast identification
Solutions
RAITH offers integrated solutions that increase performance and create market opportunities. In any production environment.
Digital RAITH
Mature software engineering for seamless integration, efficient task support, and user-friendly operation.
Mix and Match
Seamless blending of laser direct writing, ion beam, and electron beam technologies, unlocking new nanostructuring horizons.
Patterning
By eliminating stitching errors, our solution guarantees optimal performance and reliability, driving breakthroughs.
Our customers are excited with their experiences using our products. They emphasize the precision, versatility, and reliability of our multifunctional EBL system series, highlighting how it has improved their approach to nanotechnology and advanced electronics manufacturing.
