PICOMASTER XF

Highest-throughput grayscale lithography

Introduction

This high-throughput maskless lithography system seamlessly integrates precision, speed, and adaptability to cater to the most demanding microfabrication requirements. From research labs to semiconductor production, the PICOMASTER XF fosters innovation across various fields, including electronics and photonics.

Key features

  • High writing speed of up to 560 mm² / min
  • 600 nm lines-and-spaces guaranteed
  • 256 gray levels without the need to slow down
  • Versatile tool for microtechnology applications
  • Three point alignment
  • Fully automated write field calibration
  • Automatic detection of fiducial marker positions from GDSII files
Benefits

Empowering precision and speed

High throughput

Grayscale or binary exposures up to 560 mm² / min allows for a rapid optimization cycle and quick turn around for your masks and masters.

High precision

PICOMASTER XF series combine speed with precision.

Large format exposures

The throughput of the PICOMASTER XF renders, making large scale exposures possible. Substrates of up to 1.4 x 1.4 meters can be exposed using PICOMASTER XF series tools.

Opti

Fly

Rapi

Trace

Software

Experience flexibility and ease
with the latest software

Designed for automated exposure operations
Our modular software stack and our training experts enables you to execute your applications at the highest level.

Powerful

Our project manager software enables users to make complex design modifications at the click of a mouse button.

Ease of use

Our software is designed to be used by any skill level, from beginner nanotechnologists, to seasoned research professionals and anyone in between.

Efficient

Our tools calculate patterns to be written on the fly. By smart programming strategies, we avoid the need for gigabyte sized input files.
100 person-years of software programming

Technical data

Throughput up to
560 mm² / min
Gray levels in a single pass
256
Stripe size
0.6 x
200 µm
Isolated features
400 nm
Dense lines-and-spaces
600 nm
Specified full-pitch resolution
1.2 µm
Encoder resolution
1 nm in step
2 nm in scan
Scan speed up to
50 mm / s
Wafer Size
Write Size
PICOMASTER
XF 200
250 mm
200 mm
PICOMASTER
XF 500
550 mm
500 mm
PICOMASTER
XF 800
900 mm
800 mm
PICOMASTER
XF 1000
1200 mm
1000 mm
PICOMASTER
XF 1400
1500 mm
1400 mm
Are you interested in more details and insights?
PICOMASTER XF Product Flyer (.pdf)
Application pattern

Bringing applications to perfection

Microlens arrays
Photonic crystals
Masks
Fresnel lenses / FZPs / shaped lenses
Integrated photonics
Microelectronics
Solutions

RAITH offers integrated solutions that increase performance and create market opportunities. In any production environment.

To find out which configuration best suits your needs, get in touch with us.
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