Infini

Trace

Introduction InfiniTrace delivers stitch‐free patterning in the xy‐plane and flawless grayscale modulation in the z‐direction. It combines state‐of‐the-art stage mechanics with high dynamic range laser control electronics for unparalleled precision. Seamless Patterning, […]

Introduction
InfiniTrace delivers stitch‐free patterning in the xy‐plane and flawless grayscale modulation in the z‐direction. It combines state‐of‐the-art stage mechanics with high dynamic range laser control electronics for unparalleled precision.
Seamless Patterning, Dimensional Precision, and Rapid Control

Key features

InfiniTrace utilizes advanced motion control and synchronization algorithms to ensure that the entire pattern is produced as one continuous image. By eliminating the need for stitching overlapping fields, it eliminates the risk of write-field stitching errors, resulting in perfectly continuous features across large surfaces.

Our cutting-edge laser control electronics facilitate rapid and high dynamic range modulation of laser intensity that results in very fine control of grayscale exposures. A 12-bit dynamic range pattern generator, enables smooth grayscale transitions via 4096 gray levels. This capability allows for the creation of micro-optics and gradient features with finely tuned 3D structures, offering new avenues in applications that demand variable exposure profiles.

Our robust stage mechanics deliver precise and swift movements in the xy-plane while maintaining stability. Through a tightly coupled synchronization between laser modulation and stage positioning, InfiniTrace guarantees flawless patterning over complex and variable substrates.
Benefits for applications

InfiniTrace Supremacy: 0-stitching, high-resolution, high-dynamic range grayscale structures

Uninterrupted, High-Resolution Patterning

Eliminating stitch artifacts ensures that every pattern retains its intended resolution and uniformity be it a high-resolution binary exposure or a precise 2.5D micro-optics. This is especially critical for applications in applications where stittching in xy-planes or z-direction are detrimental to the performance. Such application areas include micro-optics, integrated photonics and optical digital security systems where even minor imperfections can compromise device performance.

Advanced Grayscale Structuring Capabilities

The ability to control exposure gradations in the z-axis opens opportunities for fabricating complex 2.5D microstructures with precise control over depth and morphology. This benefit is crucial in emerging fields such as micro-LEDs, 3D displays, AR/VR/XR waveguides, face and fingerprint sensors where microlens arrays play cruicial roles.

Improved Productivity with Superior Exposures

Stitchfree products mean better products. InfiniTrace ensures that the patterns are free of both later and graylevel stitching artifacts which, in turn, means you are getting the best value out of your laser lithography system. No need to play around with third party software to minimize stitching artifacts, no re-makes to improve quality: get the best possible master right away.
How it works

Periodic patterning without stitching errors using MBMS technology

Integrated Motion Control and Laser Modulation

InfiniTrace operates by synchronizing advanced motion platforms with high-resolution encoders together with high-speed and high-dynamic range laser modulation electronics. At the heart of this technology lies our split-stage exposure strategy. In this exposure strategy the laser spot is stationary with respect to the optical axis, and the sample is scanned under a writing module that steps at each scan pass. This is explained in Figure 1. The step and scan axes shown in Figure 1a both have high resolution encoders with single digit nanometer motion tracking capabilities.

As the scan stage moves along the y-direction, the system continuously adjusts the laser’s intensity in the z-direction based on on-the-fly calculated exposure maps and real-time sensor feedback.Then, the writing module moves an infinitesimal amount along the step direction and writes the next column of data. This extremely small step is called step-resolution and is typically some fraction of the spot size. This meandering motion continues until the whole pattern is written from start to the end. In the case of a grayscale patterns, the HDR laser intensity control ensures a smooth grayscale continuity throughout the sample.

Since the laser spot is not scanned and remains stationary with respect to the writing module optical axis, there are no writefields, therefore, there is no lateral stitching. This method ensures the best possible optical performance from the spot at all times. There are no deflection related distortions, the spot is always diffraction limited.

graphic showing the split-stage exposure strategy used in InfiniTrace technology for laser lithography
Figure 1 – Split-stage system architecture and the exposure strategy. a) A graphical depiction of the split-stage axes depicts the scan and step axes, the writing module and the vacuum chuck. A right-handed coordinate system defines the scan axis as the y-direction, and the step axis as the x-direction, while the writing module sits on the z-axis. b) The shot placement distribution at a microscopic scale as viewed in the xy-plane. The scan axis moves at high speeds, e.g. up to 400 mm/s. This back-and-forth motion is complemented by stepping the writing module a pre-determined amount (typically 1/3 to ½ of the spot size) at the end of each scan axis pass. This manner of meandering scan motion is continued until the whole pattern is completed, ensuring a seamless pattern.
Use cases

High-frequency gratings and PICs

InfiniTrace+ technology ensures a seamless patterning across large patterning areas which is beneficial for producing binary micro- and nano-optical structures such as diffraction gratings or photonic integrated circuit elements like waveguides.

Micro-optics, Diffractive Optical Elements, Microlens Arrays

For micro-diffractive-optics, precision in patterning is paramount. InfiniTrace’s stitch-free technique and grayscale control allow for the creation of intricate optical components with finely tuned refractive properties, enhancing overall device performance.

Optical Holographic Security Labels

Human optical perception is extremely sensitive to picking up individual defects in otherwise orderly patterned surfaces. Emergence of repeating defects can lead to formation of Moiré defects in the worst case. Even individual mura line defects can be picked up by a trained eye. InfiniTrace avoids formation of such defects by removing the writefields out of the equation.
Application use cases
Stitch free large area grayscale lithography of embossing features for security holograms.
Exposure of high-resolution binary and grayscale structures in a single pass, without any grayscale stitching.

Image of microlens arrays done by grayscale lithography
Large-area grayscale lithography of microlens arrays without any lateral or grayscale stitching.
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