ELPHY

Upgrade kit for SEM, FIB-SEM, or HIM

Introduction

Nanopatterning made simple: ELPHY stands for the easiest and most economical access to professional nanolithography and nanofabrication. It provides all you need to efficiently start to enter the nanolithography world. The upgrade kits, also known as “lithography attachments”, enable virtually any SEM or FIB to be converted into a nanolithography or nanofabrication station in order to unlock and fully exploit its nanopatterning potential – without sacrificing any of its original functionality!

Key features

  • Adaptability to any common SEM, FIB-SEM or HIM
  • Remote access to relevant SEM or FIB-SEM parameters / functionalities (beam blank, focus, write field size, stage control, …)
  • Professional GDSII file handling with RAITH proprietary GDSII editor
  • Position list for sophisticated batch job automation (including scripting)
  • Patterning on image functionality
  • FLEXposure directional scanning modes
  • Advanced lithography functionality for, e.g., 3D processes or proximity effect correction
  • Sophisticated FIB-specific nanopatterning capabilities
  • Unique hardware concept providing the equivalent of more than 16-bit main DACs only for sub-nm pattern placement control
Benefits

Create your own nanolithography system

Highest flexibility and cost-effectiveness

Depending on the SEM or FIB-SEM performance, your specific applications and related requirements for stability or ultimate precision, and finally your budget, there are 3 different ELPHY systems to choose from according to your needs.

Access to the Digital RAITH Nanosuite

No other system can match the RAITH software suite in terms of flexibility, intuitiveness, and ease of use – all embedded in a true multi-user management system. All advanced and fully integrated software modules, well established and also used in higher grade RAITH EBL turnkey systems, can be accessed already with ELPHY.

Much more than EBL functionality only

ELPHY MultiBeam includes all comprehensive multiple technique nanopatterning functionality in a single tool, not limited to Electron Beam Lithography (EBL). It is also suited for Focused Ion Beam Nanofabrication, gas-assisted Focused Electron- or Ion Beam Induced Processes (FEBIP/FIBIP), like etching or deposition, and Helium ion beam patterning.

Perfect

Shapes

Software

Electron beam lithography control software for nanopatterning: Nothing compares!

Designed for automated exposure operations
The proprietary Digital RAITH Nanosuite control software, with its various modules, is the most comprehensive and fully integrated nanolitho­graphy software available.

GDSII CAD layout editor

The integrated professional layout design editor / viewer eliminates the need for third-party software, streamlining data import and conversion processes.

Mix and Match capabilities

Whether your application involves contacting nanoscaled features, automatic mark recognition for perfect overlay, multilevel lithography, or combining different lithography techniques, the RAITH Nanosuite delivers adequate functionalities and workflows.

Full exposure job automation & customization

System operators can control all system functionalities and exploit its capabilities from a single software platform, eliminating the need to exchange data between different programs.

Dedicated imaging and metrology functionality

As a lithographer, you want to expose your sample and also verify your design. To ensure that your sample’s structures meet the dimensionality of the original design, the Digital RAITH Nanosuite offers comprehensive imaging and metrology capabilities.

True multi-user environment

RAITH Nanosuite offers more than Windows Explorer – like data administration. User authentication is required for logging in, and different user levels allow access to specific sensitive system parameters. Each user finds the system as they left it and doesn’t interfere with others.

Proximity effect correction

RAITH Nanosuite ensures physics are considered throughout integrated proximity effect corrections. Complex electron interactions in resist and in the sample sometimes require comprehensive optimization of local dose distribution. The integrated proximity effect correction ensures highest pattern fidelity when applied to original GDSII design and can simulate 3D resist profiles.

3D / grayscale lithography

Knowing the resist contrast curve is essential for properly transferring equidistant gray levels into your resist. The RAITH Nanosuite supports resist contrast curve data import and calculates appropriate local dose distribution accordingly.

GDSII-patterning on image

RAITH Nanosuite can acquire an image and directly overlay a GDSII design onto it without the need for time-consuming overlay or mark recognition procedures. This can drastically speed up nanocontacting applications, and deposition or milling jobs.
100 person-years of software programming

Technical data

20 MHz
Max. writing frequency
8x16 bit DACs
2 main 16 bit DACs and 2x3
multiplying DACs for calibration
Max. patterning frequency
Min. dwell time increment
Outputs
Thermostabilization
Colored touch screen display
Signal router, end point detection
ELPHY Quantum
6 MHz
83 ns
BNC
no
no
no
ELPHY Plus
20 MHz
1 ns
BNC
yes
no
no
ELPHY MultiBeam
20 MHz
1 ns
differential (BNC)
yes
yes
yes
Are you interested in more details and insights?
ELPHY Product Brochure (.pdf)
Application pattern

Single write field applications across all scientific disciplines

Quantum effect device
Prototyping of optical resonators – (F. Perez-Willard)/Zeiss
Prototyping of optical resonators – F. Pérez-Willard
Nano mechanical resonator for sensing applications – M.Ali, UAlberta, CA
Insulator deposition for growth rate studies
DEMUX device – J. Degenhardt, University of Duisburg, Germany
CMOS decoder circuit, aligned e‑beam pattern with CMOS Metal 5 vias – Kuk-Hwan Kim, EECS, University of Michigan, USA
Inner part of photonic crystal with defect
Conductive 3D deposition for optimized contact resistance
Solutions

RAITH offers integrated solutions that increase performance and create market opportunities. In any production environment.

References
Our customers are excited with their experiences using our products. They emphasize the precision, versatility, and reliability of our ELPHY system series, highlighting how it has improved their approach to nanotechnology and advanced electronics manufacturing.
Jay LeFebvre working with ELPHY by RAITH at the University of California Riverside.

ELPHY at University of California Riverside, Jay LeFebvre

“Recently, the Oxide-Nano Electronics Laboratory (ONELAB) at the University of California, Riverside had the Raith ELPHY lithography add-on installed to a helium focused ion beam system […]

To find out which configuration best suits your needs, get in touch with us.
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