Easy

Switch

Change your system resolution at ease and experience a new level of efficiency

Introduction

Experience a new level of efficiency with EasySwitch – the intelligent solution that automates spot size selection through advanced NA-Switch technology. EasySwitch is designed to seamlessly change your system resolution without the need for mechanical lens changes. At all times, it ensures that you maintain precise alignment and consistent performance accross multiple spot sizes. This innovative feature not only streamlines your workflow, but also delivers speed and reliability.

(V2) We are here to help you and deal with your concerns.

Key features

Benefits 4col or more

(V2) Electron beam lithography has never been easier

High system stability

System embodies innovation and stability, offering consistent high performance throughout its lifetime. Its environment-tolerant shield ensures system stability even in less ideal laboratory environments, providing reliability and peace of mind to users.

Efficiency and time savings

Experience streamlined operations and significant time savings thanks to automated calibrations and batch fabrication.

Shortest time to result

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Shortest time to result

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How it works

Periodic patterning without stitching errors using MBMS technology

Option 2: Moving Beam / Moving Stage

periodixx is another unique exposure technology with “zero stitching error” approach that is exclusively available for Raith EBL and FIB systems.

Large-area periodic structures with high pattern fidelity are particularly important in photonics and plasmonics. periodixx was developed to meet the need for a fabrication technique enabling the production of superior devices with periodic structures.

The exposure mode is based on Raith’s modulated beam moving stage (MBMS) technology and complements the traxx exposure mode, which uses Raith’s well-established fixed beam moving stage (FBMS) technology. FBMS allows continuous writing of elongated paths such as optical waveguides without stitching; the width of the path is defined by dynamic beam expansion.

However, in MBMS exposure mode the (repetitive periodic) beam movement is defined such that the combination of patterning and synchronized continuous movement of the laser interferometer stage results in stitch-free, strip-shaped periodic structures.