Patterning

Introduction

Pattern generation is at the core of advanced nanofabrication writing techniques. Achieving resolutions and writing accuracies down to 10 nm or less requires intelligent layout management and high-precision control of both beam and stage movements.
Modern pattern generators provide efficient writing capabilities. They support a wide variety of shapes and flexible, intelligent fill strategies for exposure.
Algorithmic patterning enables the integration of user-defined code for custom shapes and layout formats, providing tailored solutions for new and complex applications.
Accurate stitching supported by laser interferometer stages and stitch-free nanopatterning solutions are essential for maintaining precision and seamless fabrication across write field boundaries for elongated structures. High throughput is critical to support the patterning of full wafers or even larger substrates, ensuring efficiency in large-scale fabrication.

RAITH leads the industry with state-of-the-art direct patterning solutions, offering unparalleled precision and control for seamless fabrication processes.

RAITH customers benefit from extensive expertise and dedicated support, ensuring proper selection and optimal performance of seamless patterning solutions.

RAITH’s track record of success and innovation in seamless patterning speaks for itself, making it the trusted choice for achieving unique and precise fabrication results.

Benefits

Unlocking possibilities

RAITH technologies make even the most challenging designs possible, offering advanced solutions and precise tools for fast design development.

Enhancing final device quality

Various stitch-free methods available for different RAITH tools ensure that your final device quality will not be compromised and will be delivered as it was supposed.

From m² to nm

Achieve sub-micron precision even on 1-meter substrates for flat TV panels with RAITH tools. Our stitch-free technology ensures quality patterning from square meters to nanometers.

Patterning solutions for seamless designs

Elements

When small things needs to be big

A unique feature is based on a fixed beam, moving stage with a “zero stitching error” approach. Unlike conventional stitching exposures, it utilizes sophisticated FBMS technology in an exclusive continuous writing mode. The beam remains stationary while the stage beneath it follows shaped paths of the desired patterns. Another method allows for the continuous writing of elongated paths, such as optical waveguides, without stitching; the width of the path is defined by dynamic beam expansion. Additionally, this unique exposure mode is based on a modulated beam, moving stage approach and complements the primary exposure mode. In this method, the repetitive periodic beam movement is defined. The combination of patterning and synchronized continuous movement of the laser interferometer stage results in stitch-free, strip-shaped periodic structures with high pattern fidelity, particularly important in photonics and plasmonics.

A novel patterning methodology designed to meet the escalating demand for efficient handling of new non-Manhattan shapes. This innovative approach enables the integration of user-defined algorithms into the pattern generator software through an userhook.dll, allowing operators to incorporate custom C# code. Consequently, the functionality of the EBL system can be expanded to accommodate new shapes and tailored design data formats at the pattern generator level. This flexibility makes it an invaluable tool for researchers and engineers by reducing turnaround times and allowing for rapid prototyping and development.

Highly efficient data processing ensures the best pattern fidelity achievable in the shortest possible time. Leveraging advanced algorithms and optimized workflows, it streamlines the data processing pipeline, facilitating rapid and precise pattern generation essential for cutting-edge applications in nanofabrication and beyond.

The laser direct write series PICOMASTER XF’s optical module technology allows for rapid direct laser writing processes, which are fast enough to be used for substrates up to 1 meter (and even larger). It delivers swift processing speeds coupled with a resolution down to 600 nm. Providing stitch-free results, this cutting-edge technology ensures precise and seamless fabrication, empowering users to achieve intricate designs with unparalleled efficiency and accuracy in large display industries, packaging, and security markets.