August 17, 2017
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Product
EBPG at Chalmers - University of Technology, Sweden
E-LINE, our well-established and unique multifunctional nanoengineering EBL system, is now available in its fourth generation after a major update. As well as being packed with all the good features you are already familiar with, it now offers even more functionalities and enhanced performance. With a new and innovative FPGA-based 50 MHz / 20-bit pattern generator, it comes with a beam size of 1.2 nm and improved stitching and overlay specifications now at 25 nm (mean + 3sigma). In addition, E-LINE continues to provide ultimate versatility and application-specific options and features that have earned it the title of “the Swiss Army knife of nanofabrication.”
Maximum versatility for widest application bandwidth
E-LINE has always been RAITH’s most versatile EBL system, designed for advanced research and prototyping. And it will continue to be so. Multiple nanoengineering options allow users to configure the system to their specific needs. In addition, the E-LINE enables an entire workflow to be covered in one single system. Fabricate, navigate, image, characterize, analyze, measure, modify—all in situ.
Intuitive control, innovative capabilities
With new software modules as well as column automated procedures, E-LINE is now easier to use than ever before and yields even better results. On top of the improved performance specs, it also offers application-focused features to improve and simplify lithography beyond specs—for example, stitching-error-free writing, algorithmic patterning, innovative design fracturing methods, a new in-lens BSE detector, gas injection system for FEBIP, and nanomanipulators for tasks such as electrical probing.
Upgradability for a system that evolves with your research
E-LINE has been designed as a configurable open platform without compromising on EBL performance. The system can thus be customized and field-upgraded at any time in the future. This approach ensures that E-LINE keeps pace with the most recent research trends and adapts to them—even long after the original system purchase.
Better specification, improved performance
The new E-LINE not only delivers better beam size, stitching, and overlay specification, but also dramatically simplifies working with lithography. Get in touch with us now and find out more about the new and improved E-LINE!
Are you interested in more details and insights?
New E-LINE Flyer
