Introduction
The transfer of innovation from Lab-to-Fab requires Fab-compatible processes and protocols in Labs. VECTOR combines key capabilities such as process characterization, lithography process control, defect review, and inspection in one automated SEM. Precise and automated measurements are crucial in transferring cutting-edge nanotechnology into new industry devices. VECTOR bridges the gap between manual analytical SEMs and dedicated costly CD-SEMs production systems, making it the most suitable solution for academia, core facilities, and industry.
Benefits
Taking SEM measurements to the next level
Automated workflows without user influence
With CAD-file and / or KLARF import, VECTOR has ultimate navigation and automation capabilities. Recipe based job files for automated acquisition and evaluation of 10.000s of images can be easily generated.
Precision guaranteed
High-resolution sensors and automated calibration routines guarantee the mandatory precision and accuracy for full-wafer inspections.
Enhanced positioning accuracy
The integrated laser interferometer stage achieves 1 nm positioning accuracy across the wafer – no more image counting. Plus, the environmental shield eliminates external influences like vibrations, temperature drifts, and magnetic fields.
Connectivity
VECTOR can be connected to all RAITH nanofabrication systems to fuel yield and productivity improvements, as well as enhance ease of use. Innovation cycle times will be reduced.
Fast
Scan
Ultra
Positioning
3-in-1 solution for characterization and verification of nanostructuring processes
Automatically evaluate metrology parameters such as CD variation, gap size, LER, etc., facilitating efficient process window analysis and control
Automated SEM imaging
Metrology
Defect inspection
Software
Creating information out of data
Design and execute complex patterns
The proprietary Digital RAITH Nanosuite control software, with its various modules, is the most comprehensive platform for integrated solutions and additional external software modules.
Configurable analysis capabilities
- Metrology
- Defect review
- SEM-inspection
- Defect review
- SEM-inspection
Python scripting
Interface with Python scripting for extended automation and customizing.
Connectivity
Direct import of inspection poins/areas of interest from RAITH nanofabrication tools like electron, laser, or ion beam writers.
100 person-years of software programming
Technical data
Comprehensive database
Graphical display of results
Tunable and automated
column calibration procedures
Graphical display of results
Tunable and automated
column calibration procedures
Dedicated software
Measurement precision
1 nm 3 sigma
Measurement accuracy
Within +/- 0.02%
of NIST traceable
standard
of NIST traceable
standard
Beam position stability
≤ 200 nm / 8 hrs
High accuracy over the full travel range also enables precise long-distance measurements much larger than one field of view (FOV)
≤ 0.5 % / 8 hrs
Image resolution
< 1 nm
Are you interested in more details and insights?
VECTOR brochure (.pdf)
Application use cases
Bringing applications to perfection
Definition of imaging locations
based on design file
based on design file
Wafer map of critical dimension created from more than 10000 imaging sites
Sensitivity map of detected anomalies
Solutions
RAITH offers integrated solutions that increase performance and create market opportunities. In any production environment.
Process Control
Revolutionize nanofabrication quality management, enable extensive data acquisition at the nanoscale, and beyond.
Mix and Match
Seamless blending of laser direct writing, ion beam, and electron beam technologies, unlocking new nanostructuring horizons.