Introduction
This high-throughput maskless lithography system seamlessly integrates precision, speed, and adaptability to cater to the most demanding microfabrication requirements. From research labs to semiconductor production, the PICOMASTER XF fosters innovation across various fields, including electronics and photonics.
Key features
- High writing speed of up to 560 mm² / min
- 600 nm lines-and-spaces guaranteed
- 256 gray levels without the need to slow down
- Versatile tool for microtechnology applications
- Three point alignment
- Fully automated write field calibration
- Automatic detection of fiducial marker positions from GDSII files
Benefits
Empowering precision and speed
High throughput
Grayscale or binary exposures up to 560 mm² / min allows for a rapid optimization cycle and quick turn around for your masks and masters.
High precision
PICOMASTER XF series combine speed with precision.
Large format exposures
The throughput of the PICOMASTER XF renders, making large scale exposures possible. Substrates of up to 1.4 x 1.4 meters can be exposed using PICOMASTER XF series tools.
Rapid
Trace
Software
Experience flexibility and ease
with the latest software
Designed for automated exposure operations
Our modular software stack and our training experts enables you to execute your applications at the highest level.
Powerful
Our project manager software enables users to make complex design modifications at the click of a mouse button.
Ease of use
Our software is designed to be used by any skill level, from beginner nanotechnologists, to seasoned research professionals and anyone in between.
Efficient
Our tools calculate patterns to be written on the fly. By smart programming strategies, we avoid the need for gigabyte sized input files.
100 person-years of software programming
Technical data
Throughput up to
560 mm² / min
Gray levels in a single pass
256
Stripe size
0.6 x
200 µm
200 µm
Isolated features
400 nm
Dense lines-and-spaces
600 nm
Specified full-pitch resolution
1.2 µm
Encoder resolution
1 nm in step
2 nm in scan
2 nm in scan
Scan speed up to
50 mm / s
Wafer Size
Write Size
Are you interested in more details and insights?
PICOMASTER XF Product Flyer (.pdf)
Application pattern
Bringing applications to perfection
Microlens arrays
Photonic crystals
Masks
Fresnel lenses / FZPs / shaped lenses
Integrated photonics
Microelectronics
Solutions
RAITH offers integrated solutions that increase performance and create market opportunities. In any production environment.
Patterning
By eliminating stitching errors, our solution guarantees optimal performance and reliability, driving breakthroughs.
Mix and Match
Seamless blending of laser direct writing, ion beam, and electron beam technologies, unlocking new nanostructuring horizons.
Digital RAITH
Mature software engineering for seamless integration, efficient task support, and user-friendly operation.