RAITH’s PICOMASTER-H Wins IHMA Excellence in Holography Award for Direct Write Lithography Technology

We are thrilled to announce that RAITH Laser Systems B.V. has been honored with the prestigious IHMA Excellence in Holography Award in the category of “Innovation in Holographic Techniques.” Our PICOMASTER-H series of products stood out for its groundbreaking advancements in resolution, precision, stability, and application versatility. This recognition cements RAITH’s role as a pioneer in maskless laser lithography solutions, catering to both research and industrial applications.

The PICOMASTER-H series was designed to meet the evolving needs of high-resolution and grayscale lithography. By offering sub-300 nm resolution and grayscale capabilities with up to 4096 levels, PICOMASTER-H can structure intricate 2.5D resist profiles via direct UV laser writing without the need for photomasks. This flexibility allows users to work seamlessly across a variety of sectors, naturally including security holograms and holographic packaging.

The system’s proprietary real-time optical autofocus capabilities, paired with laser sources of 405 nm or 375 nm and top-notch optomechanics and optics, ensures precise exposure even on difficult substrates. With maintenance-free operation and a user-friendly interface to its powerful design software, the PICOMASTER-H series maximizes efficiency, reducing downtime and enhancing performance in micro- and nanofabrication.

The IHMA Excellence in Holography Awards spotlight groundbreaking holographic techniques that push the boundaries of what is possible in security, authentication, and identity protection coupled with production efficiency. The win for RAITH highlights the powerful laser beam lithography strategies and capabilities employed by the PICOMASTER-H, which supports applications in various fields as well as advanced security printing. Its ability to deliver high precision in both lateral and grayscale resolution, backed by exceptional design software capabilities, was a decisive factor in securing this recognition.

The recognition from IHMA reaffirms the value of direct-write lithography for industries requiring precision and scalability. With systems optimized for rapid prototyping, small-batch production, and high-throughput patterning, the larger family of PICOMASTER products is a game-changer for organizations focused on innovation. Whether in research labs or production lines, whether the focus is on semiconductor and materials research, MEMS devices, or security printing industry, RAITH's technology offers a versatile solution for next-generation micro- and nanofabrication.

RAITH remains committed to advancing the field of nanofabrication, and the IHMA award inspires us to continue driving technological breakthroughs that enable industries to reach new heights and explore new dimensions. For more information about the PICOMASTER series or to discuss how our solutions can support your application, visit our product pages or get in touch.