Introduction
The PICOMASTER series is a set of advanced laser lithography systems designed for high-precision, maskless lithography tasks. Versatile in accommodating various substrate sizes, these systems are tailor-made for research and prototyping endeavors. With superior resolution capabilities and adjustable writing speeds, they set the standard for advanced lithography technology.
Key features
- Highest resolution in the market
- Standard high resolution – no compromises
- 4096 gray levels
- Always on autofocus – tracks your sample height at all times
- Powerful design software
- Low maintenance
- Compact tool – compact optical module
Benefits
Best performance tool in the laser lithography market
Highest resolution in the LBL market
We promise 300 nm lines-and-spaces with 600 nm pitch. We demonstrate results that go beyond the specifications.
High-dynamic-range grayscale lithography
Our 12-bit gray level dynamic range allows modulation of the laser beam intensity at 4096 levels at a rate of 10 million times per second – only one hundred nanoseconds elapse between these operations.
High precision optomechanics
PICOMASTER stages and optics are built from the top-of-the-line components. Our stages offer unprecedented stability and precision. When the two are combined, it offers a powerful tool that is able to meet and exceed your expectations.
Infini
Trace
Opti
Fly
Software
Experience flexibility and ease
with the latest software
Designed for automated exposure operations
Our modular software stack and our training experts enable you to execute your applications at the highest level.
Powerful
Our project manager software enables users to make complex design modifications at the click of a mouse button.
Ease of use
Our software is designed to be used by any skill level, from beginner nanotechnologists, to seasoned research professionals and anyone in between.
Efficient
Our tools calculate patterns to be written on the fly. By smart programming strategies, we avoid the need for gigabyte sized input files.
100 person-years of software programming
Technical data
< 300 nm
Lines-and-spaces
4096
Gray levels
405 or 375 nm
Source wavelength
Exposable wafer size
Write size
Min. spot size
Isolated features
Dense lines-and-spaces
Full-pitch resolution
Overlay accuracy
Spot options
Encoder resolution
Maximum scan speed
Throughput*
* Highly pattern and setting dependent. Calculated based on the largest write field height per tool.
Are you interested in more details and insights?
PICOMASTER Product Flyer (.pdf)
Application pattern
Bringing applications to perfection
Microlens arrays
Photonic crystals
MEMS / MOEMS
Microfluidics
High-frequency gratings
Fresnel lenses / FZPs / shaped lenses
Microelectronics
Integrated silicon photonics
Ultra-thick resist processing
Solutions
Our integrated solutions increase performance and connectivity. In any production environment.
Patterning
By eliminating stitching errors, our solution guarantees optimal performance and reliability, driving breakthroughs.
Mix and Match
Seamless blending of laser direct writing, ion beam, and electron beam technologies, unlocking new nanostructuring horizons.
Digital RAITH
Mature software engineering for seamless integration, efficient task support, and user-friendly operation.
Our customers are excited with their experiences using our products. They emphasize the precision, versatility, and reliability of our PICOMASTER system series, highlighting how it has improved their approach to nanotechnology and advanced electronics manufacturing.