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Choose from our different multifunctional EBL systems:

eLINE Plus Logo

This versatile multi-technique nanolithography system combines an EBL system with an open platform for customized experiments and processes. With a range of different options, the eLINE Plus is the most versatile and unique nanoengineering EBL system available.


The EBL-SEM hybrid system combines state-of-the-art nanolithography and analytical SEM imaging in a single tool. PIONEER Two defines a new and unique class of affordable professional electron beam lithography systems for both nanofabrication and SEM-based analytics.

RAITH150 Two Logo

RAITH150 Two direct write tool offers ultra-high-resolution EBL with excellent imaging capability. Sub-8 nm structures can be achieved on sample sizes from a few mm to 8-inch wafers, while thermal stabilization supports highest performance even in challenging environments.