Symposium at Stanford University on direct-write applications - a huge success
The broad spectrum of talks was attended by more than 120 interested researchers from Stanford, but also from various academic and industrial sites in the Bay Area as well as other parts of the country and Canada. Speakers from Zeiss, Nanoscribe, and Alvéole had been invited in addition to Raith and HIMT, providing the audience with the broadest possible overview of different aspects of nanolithography. Topics ranged from “Reversing EBL Technology for Large-Area Imaging and Nanometrology” and “Gallium Focused Ion Beam Applications” to “Write Strategies for Optical Direct Write Lithography,” providing insights into various aspects of direct write, optical and electron beam lithography.
The SNF facility with 10,000-square-foot cleanroom serves as a research lab for scientists from all disciplines within micro- and nanofabrication, and therefore offered the perfect setting for the symposium.
Raith would like to thank everyone who attended for their lively participation, as well as the SNF for providing an excellent framework for the successful workshop. To participate in future events, check out our website or follow us on LinkedIn for information on upcoming events.