ELPHY has been a cornerstone of the RAITH portfolio and the entry system to the world of lithography for hundreds of customers. It is the world’s most successful pattern generator and we work continuously on its improvement. We are therefore very proud to introduce the new ELPHY in its 9th generation.
Upgrade your SEM or FIB-SEM
Your SEM or FIB-SEM is capable of much more than just imaging or milling. With the new ELPHY, you will benefit from following main features that can be exploited for advanced nanofabrication:
- Remote access to relevant SEM or FIB-SEM parameters / functionalities (beam blank, focus, write field size, stage control, …)
- Professional GDSII file handling with RAITH proprietary GDSII editor
- Position list for sophisticated batch job automation (including scripting)
- GDSII-Patterning on image functionality
- PerfectShapes technology for flexible directional scanning modes and patterning attributes to minimize line edge roughness
- Advanced lithography functionality for, e.g., 3D processes, FEBIP/FIBIP or proximity effect correction
- Sophisticated FIB-specific nanopatterning capabilities
- A unique hardware concept for ultimate precision, flexibility and automation for complex processes
- Advanced writefield alignment procedure with up to 8 reference points
New features, better performance
ELPHY now comes with max. 50 MHz and 20 bit, making it even faster and more precise than ever before. ELPHY further provides differential scan signal outputs to guarantee for optimum and lowest noise signal quality that is routed to the external scan interface of your SEM or FIB-SEM.
SEMs typically are not optimized for precise square-like field of views, specifically when zooming out to several 10s if not 100s of µm. ELPHY offers the capability to correct for distortions in large field of views or corresponding writefields respectively.
With an advanced writefield alignment, the inherent writefield distortions of an SEM /FIB-SEM can be significantly reduced thus allowing for much better pattern placement accuracies, specifically in the writefield corners for medium-sized and large writefields.
Patterns designed with GDSII are exposed on a design/writefield grid which is 16bit as a standard. The min. step size that can be adjusted relates to the write field size, which is getting larger with increasing writefield sizes. Relying on 20bit instead, which is provided by the new ELPHY pattern generator generation, allows for a much denser design – and consequently - exposure grid at same writefield sizes, which can result in better line edge roughness thus increasing the pattern fidelity.
ELPHY now features the most professional lithography software, the latest version of the RAITH Nanosuite, that has now migrated into ELPHY from the higher grade RAITH turnkey systems.
This all makes also ELPHY the benchmark for advanced lithography and upgrades any SEM or FIB-SEM with nanofabrication capabilities all while maintaining its full original functionality.
In conclusion, ELPHY is the most comprehensive nanolithography attachment on the market. To learn more details about the ELPHY, download the product brochure here or get in touch with us now.
