We are excited to officially launch the ATHOS, RAITH’s newest and ultimate laser lithography product series, specifically engineered for holographic applications and optical security.
With ATHOS, we are redefining performance in holographic laser lithography. Whether you are creating security holograms, optically variable devices (OVDs), Fresnel lenses, or other microstructures, ATHOS delivers deep sub-micron resolution, exceptional grayscale capabilities, and highest throughput – all within a robust and intuitive system.
What makes ATHOS exceptional?
ATHOS is not just another lithography tool – it is a dedicated solution built from the ground up to meet the most demanding requirements of holographic origination.
Characterized by
- highest resolution
- best performance grayscale capabilities
- and high throughput
it is the optimal solution for the origination of holographic applications.
This is what makes it special:
No lateral stitching
Thanks to RAITH’s InfiniTrace technology and 12-bit dynamic range (4096 grayscale levels), ATHOS Nano eliminates lateral stitching errors. You can expect ultra-smooth surfaces and seamless transitions.
Advanced grayscale lithography
The RapidTrace technology integrates exceptional stage mechanics, top-notch optics, and fast grayscale exposure in real time – enabling ATHOS Rapid to write complex patterns faster and more efficiently than ever before.
Designed for challenging substrates
With OptiFly, a technology based on a hybrid autofocus strategy, ATHOS maintains optimal focus on even the most difficult surfaces – making it suitable for a wide range of substrates.
Near-electron beam lithography level resolution
ATHOS Nano approaches near-electron beam lithography (EBL) resolution without the complexities and infrastructure demands of EBL systems.
HoloSuite: RAITH´s advanced design software design
HoloSuite, our advanced holographic effect design software, defines a new standard in holographic master design. It simplifies the process of preparing complex, grayscale holographic patterns to a few clicks. Powerful processing capabilities enable real-time data transfer and immediate exposure.
This design software is characterized by a diverse set of libraries to enable the creation of complex and secure holographic designs.
A user-friendly, stable and reliable system series to address every need
ATHOS provides simple, seamless processes and workflows, from designing complex holographic patterns to lithographic exposures.
It is engineered for maximum system reliability and process stability. Consistent, high-quality results across a wide range of substrates are ensured.
And to suit your exact needs, ATHOS comes in two powerful product lines:
- ATHOS Nano: The system is focused on the highest spatial and grayscale resolution (near-electron beam lithography level resolution) at a fraction of the costs.
- ATHOS Rapid: It offers the best combination of deep sub-micron spatial resolution while providing great real-time grayscale exposure capabilities at a high throughput.
Dedicated to security holograms
ATHOS Nano
ATHOS Rapid
Sculpting your holographic vision with laser light
With the introduction of ATHOS, RAITH once again pushes the boundaries of what is possible in laser-based nanofabrication. ATHOS is not only a powerful lithography system – it is a complete solution for next-generation holographic and optical security applications.
Ready to experience ATHOS?
Join us for a fascinating webinar to explore ATHOS. Our colleagues Kahraman Keskinbora, Marc Ujma, and Adriana Umbria will introduce you to our new, cutting-edge laser lithography product family, which is tailored for holographic origination and optical security. Whether you're working on security holograms, optically variable devices (OVDs), and other holographic packaging applications, sign up for the webinar and learn more about ATHOS' unmatched resolution, grayscale capabilities, and throughput.
