Application Note

Precision Tuning of Integrated Photonic Circuits for Scalable Performance

Micropgraph Winners

Explore cutting-edge methods for addressing fabrication imperfections in photonic circuits using precise post-fabrication tuning.

Discover a novel, precise method for optimizing photonic circuits. Learn how to correct resonance deviations using an advanced combination of electron beam lithography (EBL) and focused ion beam (FIB) technologies—eliminating the need for bulky, energy-consuming devices.

Find out how to tune the photonic circuit post-fabrication with ease and download the Application Note now!

Download the Application Note.

Application note: Device trimming of photonic integrated circuits through efficient combination of EBL and FIB (.pdf)

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An advanced fabrication techniques combing EBL and FIB can perfect integrated photonic circuits for cutting-edge applications. This application note explores precise post-fabrication tuning using RAITH's electron beam lithography and focused ion beam patterning. Learn how to correct fabrication imperfections with sub-picometer accuracy for optimized photonic devices, revolutionizing data interconnects, sensors, AI accelerators, and quantum technologies.

What you will learn

How to optimize micro-ring resonators for maximum precision
The role of silicon-ion implantation in scalable, energy-efficient resonance tuning.
Insights into advanced workflows and tool integration using VELION and EBPG.

Download the Application Note now!

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Optical Telecommunication Semiconductors Quantum Technologies Consumer Electronics Life Sciences Defense & Space Materials Science Photonics Research / Rapid Prototyping

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Patterning Mix and Match Process Control Digital RAITH Holography Workflow

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Electron Beam Lithography Focused Ion Beams Laser Lithography Imaging & Analysis

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